Inkjet printhead production method

ABSTRACT

A method of producing an ink jet printhead includes steps of forming a substrate having defined therein a nozzle chamber for receiving and storing a fluid, the chamber fed at one side by an inlet passage; forming a nozzle plate in-situ on the substrate to define a nozzle opening on an opposite side of the nozzle chamber to the inlet passage; forming first and second heater elements suspended between the nozzle opening and the inlet passage, the heater elements each having two opposite planar sides and each positioned to be in direct thermal contact with the fluid stored in the nozzle chamber at both opposed planar sides; connecting the first heater element to a first drive circuit; and connecting the second heater element to a second drive circuit separate from the first drive circuit. The first heater element is formed on a different layer to the second heater element, and the first heater element is formed with a surface area larger than that the second heater element.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a Continuation of U.S. application Ser. No.12/542,664 filed Aug. 17, 2009, which is a Continuation of U.S.application Ser. No. 11/706,321 filed Feb. 15, 2007, now issued U.S.Pat. No. 7,587,822, which is a Continuation of U.S. application Ser. No.10/778,139 filed on Feb. 17, 2004, now issued U.S. Pat. No. 7,188,419,which is a Continuation-In-Part of U.S. application Ser. No. 10/302,668,filed on Nov. 23, 2002, now issued U.S. Pat. No. 7,152,958 all of whichare herein incorporated by reference.

FIELD OF THE INVENTION

The present invention relates to a thermal ink jet printhead, to aprinter system incorporating such a printhead, and to a method ofejecting a liquid drop (such as an ink drop) using such a printhead.

BACKGROUND TO THE INVENTION

The present invention involves the ejection of ink drops by way offorming gas or vapor bubbles in a bubble forming liquid. This principleis generally described in U.S. Pat. No. 3,747,120 (Stemme).

There are various known types of thermal ink jet (bubblejet) printheaddevices. Two typical devices of this type, one made by Hewlett Packardand the other by Canon, have ink ejection nozzles and chambers forstoring ink adjacent the nozzles. Each chamber is covered by a so-callednozzle plate, which is a separately fabricated item and which ismechanically secured to the walls of the chamber. In certain prior artdevices, the top plate is made of Kapton™ which is a Dupont trade namefor a polyimide film, which has been laser-drilled to form the nozzles.These devices also include heater elements in thermal contact with inkthat is disposed adjacent the nozzles, for heating the ink therebyforming gas bubbles in the ink. The gas bubbles generate pressures inthe ink causing ink drops to be ejected through the nozzles.

It is an object of the present invention to provide a useful alternativeto the known printheads, printer systems, or methods of ejecting dropsof ink and other related liquids, which have advantages as describedherein.

SUMMARY OF THE INVENTION

According to an aspect of the present disclosure, a method of producingan ink jet printhead comprises steps of forming a substrate havingdefined therein a nozzle chamber for receiving and storing a fluid, thechamber fed at one side by an inlet passage; forming a nozzle platein-situ on the substrate to define a nozzle opening on an opposite sideof the nozzle chamber to the inlet passage; forming first and secondheater elements suspended between the nozzle opening and the inletpassage, the heater elements each having two opposite planar sides andeach positioned to be in direct thermal contact with the fluid stored inthe nozzle chamber at both opposed planar sides; connecting the firstheater element to a first drive circuit; and connecting the secondheater element to a second drive circuit separate from the first drivecircuit. The first heater element is formed on a different layer to thesecond heater element, and the first heater element is formed with asurface area larger than that the second heater element.

DETAILED DESCRIPTION OF THE DRAWINGS

Preferred embodiments of the invention will now be described, by way ofexample only, with reference to the accompanying representations. Thedrawings are described as follows.

FIG. 1 is a schematic cross-sectional view through an ink chamber of aunit cell of a printhead according to an embodiment of the invention, ata particular stage of operation.

FIG. 2 is a schematic cross-sectional view through the ink chamber FIG.1, at another stage of operation.

FIG. 3 is a schematic cross-sectional view through the ink chamber FIG.1, at yet another stage of operation.

FIG. 4 is a schematic cross-sectional view through the ink chamber FIG.1, at yet a further stage of operation.

FIG. 5 is a diagrammatic cross-sectional view through a unit cell of aprinthead in accordance with the an embodiment of the invention showingthe collapse of a vapor bubble.

FIGS. 6, 8, 10, 11, 13, 14, 16, 18, 19, 21, 23, 24, 26, 28 and 30 areschematic perspective views (FIG. 30 being partly cut away) of a unitcell of a printhead in accordance with an embodiment of the invention,at various successive stages in the production process of the printhead.

FIGS. 7, 9, 12, 15, 17, 20, 22, 25, 27, 29 and 31 are each schematicplan views of a mask suitable for use in performing the production stagefor the printhead, as represented in the respective immediatelypreceding figures.

FIG. 32 is a further schematic perspective view of the unit cell of FIG.30 shown with the nozzle plate omitted.

FIG. 33 is a schematic perspective view, partly cut away, of a unit cellof a printhead according to the invention having another particularembodiment of heater element.

FIG. 34 is a schematic plan view of a mask suitable for use inperforming the production stage for the printhead of FIG. 33 for formingthe heater element thereof

FIG. 35 is a schematic perspective view, partly cut away, of a unit cellof a printhead according to the invention having a further particularembodiment of heater element.

FIG. 36 is a schematic plan view of a mask suitable for use inperforming the production stage for the printhead of FIG. 35 for formingthe heater element thereof.

FIG. 37 is a further schematic perspective view of the unit cell of FIG.35 shown with the nozzle plate omitted.

FIG. 38 is a schematic perspective view, partly cut away, of a unit cellof a printhead according to the invention having a further particularembodiment of heater element.

FIG. 39 is a schematic plan view of a mask suitable for use inperforming the production stage for the printhead of FIG. 38 for formingthe heater element thereof.

FIG. 40 is a further schematic perspective view of the unit cell of FIG.38 shown with the nozzle plate omitted.

FIG. 41 is a schematic section through a nozzle chamber of a printheadaccording to an embodiment of the invention showing a suspended beamheater element immersed in a bubble forming liquid.

FIG. 42 is schematic section through a nozzle chamber of a printheadaccording to an embodiment of the invention showing a suspended beamheater element suspended at the top of a body of a bubble formingliquid.

FIG. 43 is a diagrammatic plan view of a unit cell of a printheadaccording to an embodiment of the invention showing a nozzle.

FIG. 44 is a diagrammatic plan view of a plurality of unit cells of aprinthead according to an embodiment of the invention showing aplurality of nozzles.

FIG. 45 is a diagrammatic section through a nozzle chamber not inaccordance with the invention showing a heater element embedded in asubstrate.

FIG. 46 is a diagrammatic section through a nozzle chamber in accordancewith an embodiment of the invention showing a heater element in the formof a suspended beam.

FIG. 47 is a diagrammatic section through a nozzle chamber of a priorart printhead showing a heater element embedded in a substrate.

FIG. 48 is a diagrammatic section through a nozzle chamber in accordancewith an embodiment of the invention showing a heater element defining agap between parts of the element.

FIG. 49 is a diagrammatic section through a nozzle chamber not inaccordance with the invention, showing a thick nozzle plate.

FIG. 50 is a diagrammatic section through a nozzle chamber in accordancewith an embodiment of the invention showing a thin nozzle plate.

FIG. 51 is a diagrammatic section through a nozzle chamber in accordancewith an embodiment of the invention showing two heater elements.

FIG. 52 is a diagrammatic section through a nozzle chamber of a priorart printhead showing two heater elements.

FIG. 53 is a diagrammatic section through a pair of adjacent unit cellsof a printhead according to an embodiment of the invention, showing twodifferent nozzles after drops having different volumes have been ejectedtherethrough.

FIGS. 54 and 55 are diagrammatic sections through a heater element of aprior art printhead.

FIG. 56 is a diagrammatic section through a conformally coated heaterelement according to an embodiment of the invention.

FIG. 57 is a diagrammatic elevational view of a heater element,connected to electrodes, of a printhead according to an embodiment ofthe invention.

FIG. 58 is a schematic exploded perspective view of a printhead moduleof a printhead according to an embodiment of the invention.

FIG. 59 is a schematic perspective view the printhead module of FIG. 58shown unexploded.

FIG. 60 is a schematic side view, shown partly in section, of theprinthead module of FIG. 58.

FIG. 61 is a schematic plan view of the printhead module of FIG. 58.

FIG. 62 is a schematic exploded perspective view of a printheadaccording to an embodiment of the invention.

FIG. 63 is a schematic further perspective view of the printhead of FIG.62 shown unexploded.

FIG. 64 is a schematic front view of the printhead of FIG. 62.

FIG. 65 is a schematic rear view of the printhead of FIG. 62.

FIG. 66 is a schematic bottom view of the printhead of FIG. 62.

FIG. 67 is a schematic plan view of the printhead of FIG. 62.

FIG. 68 is a schematic perspective view of the printhead as shown inFIG. 62, but shown unexploded.

FIG. 69 is a schematic longitudinal section through the printhead ofFIG. 62.

FIG. 70 is a block diagram of a printer system according to anembodiment of the invention.

DETAILED DESCRIPTION

In the description than follows, corresponding reference numerals, orcorresponding prefixes of reference numerals (i.e. the parts of thereference numerals appearing before a point mark) which are used indifferent figures relate to corresponding parts. Where there arecorresponding prefixes and differing suffixes to the reference numerals,these indicate different specific embodiments of corresponding parts.

Overview of the Invention and General Discussion of Operation

With reference to FIGS. 1 to 4, the unit cell 1 of a printhead accordingto an embodiment of the invention comprises a nozzle plate 2 withnozzles 3 therein, the nozzles having nozzle rims 4, and apertures 5extending through the nozzle plate. The nozzle plate 2 is plasma etchedfrom a silicon nitride structure which is deposited, by way of chemicalvapor deposition (CVD), over a sacrificial material which issubsequently etched.

The printhead also includes, with respect to each nozzle 3, side walls 6on which the nozzle plate is supported, a chamber 7 defined by the wallsand the nozzle plate 2, a multi-layer substrate 8 and an inlet passage 9extending through the multi-layer substrate to the far side (not shown)of the substrate. A looped, elongate heater element 10 is suspendedwithin the chamber 7, so that the element is in the form of a suspendedbeam. The printhead as shown is a microelectromechanical system (MEMS)structure, which is formed by a lithographic process which is describedin more detail below.

When the printhead is in use, ink 11 from a reservoir (not shown) entersthe chamber 7 via the inlet passage 9, so that the chamber fills to thelevel as shown in FIG. 1. Thereafter, the heater element 10 is heatedfor somewhat less than 1 micro second, so that the heating is in theform of a thermal pulse. It will be appreciated that the heater element10 is in thermal contact with the ink 11 in the chamber 7 so that whenthe element is heated, this causes the generation of vapor bubbles 12 inthe ink. Accordingly, the ink 11 constitutes a bubble forming liquid.FIG. 1 shows the formation of a bubble 12 approximately 1 microsecondafter generation of the thermal pulse, that is, when the bubble has justnucleated on the heater elements 10. It will be appreciated that, as theheat is applied in the form of a pulse, all the energy necessary togenerate the bubble 12 is to be supplied within that short time.

Turning briefly to FIG. 34, there is shown a mask 13 for forming aheater 14 of the printhead (which heater includes the element 10referred to above), during a lithographic process, as described in moredetail below. As the mask 13 is used to form the heater 14, the shape ofvarious of its parts correspond to the shape of the element 10. The mask13 therefore provides a useful reference by which to identify variousparts of the heater 14. The heater 14 has electrodes 15 corresponding tothe parts designated 15.34 of the mask 13 and a heater element 10corresponding to the parts designated 10.34 of the mask. In operation,voltage is applied across the electrodes 15 to cause current to flowthrough the element 10. The electrodes 15 are much thicker than theelement 10 so that most of the electrical resistance is provided by theelement. Thus, nearly all of the power consumed in operating the heater14 is dissipated via the element 10, in creating the thermal pulsereferred to above.

When the element 10 is heated as described above, the bubble 12 formsalong the length of the element, this bubble appearing, in thecross-sectional view of FIG. 1, as four bubble portions, one for each ofthe element portions shown in cross section.

The bubble 12, once generated, causes an increase in pressure within thechamber 7, which in turn causes the ejection of a drop 16 of the ink 11through the nozzle 3. The rim 4 assists in directing the drop 16 as itis ejected, so as to minimize the chance of a drop misdirection.

The reason that there is only one nozzle 3 and chamber 7 per inletpassage 9 is so that the pressure wave generated within the chamber, onheating of the element 10 and forming of a bubble 12, does not effectadjacent chambers and their corresponding nozzles.

The advantages of the heater element 10 being suspended rather thanbeing embedded in any solid material, is discussed below.

FIGS. 2 and 3 show the unit cell 1 at two successive later stages ofoperation of the printhead. It can be seen that the bubble 12 generatesfurther, and hence grows, with the resultant advancement of ink 11through the nozzle 3. The shape of the bubble 12 as it grows, as shownin FIG. 3, is determined by a combination of the inertial dynamics andthe surface tension of the ink 11. The surface tension tends to minimizethe surface area of the bubble 12 so that, by the time a certain amountof liquid has evaporated, the bubble is essentially disk-shaped.

The increase in pressure within the chamber 7 not only pushes ink 11 outthrough the nozzle 3, but also pushes some ink back through the inletpassage 9. However, the inlet passage 9 is approximately 200 to 300microns in length, and is only approximately 16 microns in diameter.Hence there is a substantial viscous drag. As a result, the predominanteffect of the pressure rise in the chamber 7 is to force ink out throughthe nozzle 3 as an ejected drop 16, rather than back through the inletpassage 9.

Turning now to FIG. 4, the printhead is shown at a still furthersuccessive stage of operation, in which the ink drop 16 that is beingejected is shown during its “necking phase” before the drop breaks off.At this stage, the bubble 12 has already reached its maximum size andhas then begun to collapse towards the point of collapse 17, asreflected in more detail in FIG. 5.

The collapsing of the bubble 12 towards the point of collapse 17 causessome ink 11 to be drawn from within the nozzle 3 (from the sides 18 ofthe drop), and some to be drawn from the inlet passage 9, towards thepoint of collapse. Most of the ink 11 drawn in this manner is drawn fromthe nozzle 3, forming an annular neck 19 at the base of the drop 16prior to its breaking off

The drop 16 requires a certain amount of momentum to overcome surfacetension forces, in order to break off As ink 11 is drawn from the nozzle3 by the collapse of the bubble 12, the diameter of the neck 19 reducesthereby reducing the amount of total surface tension holding the drop,so that the momentum of the drop as it is ejected out of the nozzle issufficient to allow the drop to break off.

When the drop 16 breaks off, cavitation forces are caused as reflectedby the arrows 20, as the bubble 12 collapses to the point of collapse17. It will be noted that there are no solid surfaces in the vicinity ofthe point of collapse 17 on which the cavitation can have an effect.

Manufacturing Process

Relevant parts of the manufacturing process of a printhead according toembodiments of the invention are now described with reference to FIGS. 6to 29.

Referring to FIG. 6, there is shown a cross-section through a siliconsubstrate portion 21, being a portion of a Memjet printhead, at anintermediate stage in the production process thereof. This figurerelates to that portion of the printhead corresponding to a unit cell 1.The description of the manufacturing process that follows will be inrelation to a unit cell 1, although it will be appreciated that theprocess will be applied to a multitude of adjacent unit cells of whichthe whole printhead is composed.

FIG. 6 represents the next successive step, during the manufacturingprocess, after the completion of a standard CMOS fabrication process,including the fabrication of CMOS drive transistors (not shown) in theregion 22 in the substrate portion 21, and the completion of standardCMOS interconnect layers 23 and passivation layer 24. Wiring indicatedby the dashed lines 25 electrically interconnects the transistors andother drive circuitry (also not shown) and the heater elementcorresponding to the nozzle.

Guard rings 26 are formed in the metallization of the interconnectlayers 23 to prevent ink 11 from diffusing from the region, designated27, where the nozzle of the unit cell 1 will be formed, through thesubstrate portion 21 to the region containing the wiring 25, andcorroding the CMOS circuitry disposed in the region designated 22.

The first stage after the completion of the CMOS fabrication processconsists of etching a portion of the passivation layer 24 to form thepassivation recesses 29.

FIG. 8 shows the stage of production after the etching of theinterconnect layers 23, to form an opening 30. The opening 30 is toconstitute the ink inlet passage to the chamber that will be formedlater in the process.

FIG. 10 shows the stage of production after the etching of a hole 31 inthe substrate portion 21 at a position where the nozzle 3 is to beformed. Later in the production process, a further hole (indicated bythe dashed line 32) will be etched from the other side (not shown) ofthe substrate portion 21 to join up with the hole 31, to complete theinlet passage to the chamber. Thus, the hole 32 will not have to beetched all the way from the other side of the substrate portion 21 tothe level of the interconnect layers 23.

If, instead, the hole 32 were to be etched all the way to theinterconnect layers 23, then to avoid the hole 32 being etched so as todestroy the transistors in the region 22, the hole 32 would have to beetched a greater distance away from that region so as to leave asuitable margin (indicated by the arrow 34) for etching inaccuracies.But the etching of the hole 31 from the top of the substrate portion 21,and the resultant shortened depth of the hole 32, means that a lessermargin 34 need be left, and that a substantially higher packing densityof nozzles can thus be achieved.

FIG. 11 shows the stage of production after a four micron thick layer 35of a sacrificial resist has been deposited on the layer 24. This layer35 fills the hole 31 and now forms part of the structure of theprinthead. The resist layer 35 is then exposed with certain patterns (asrepresented by the mask shown in FIG. 12) to form recesses 36 and a slot37. This provides for the formation of contacts for the electrodes 15 ofthe heater element to be formed later in the production process. Theslot 37 will provide, later in the process, for the formation of thenozzle walls 6, that will define part of the chamber 7.

FIG. 13 shows the stage of production after the deposition, on the layer35, of a 0.25 micron thick layer 38 of heater material, which, in thepresent embodiment, is of titanium nitride.

FIG. 14 shows the stage of production after patterning and etching ofthe heater layer 38 to form the heater 14, including the heater element10 and electrodes 15.

FIG. 16 shows the stage of production after another sacrificial resistlayer 39, about 1 micron thick, has been added.

FIG. 18 shows the stage of production after a second layer 40 of heatermaterial has been deposited. In a preferred embodiment, this layer 40,like the first heater layer 38, is of 0.25 micron thick titaniumnitride.

FIG. 19 then shows this second layer 40 of heater material after it hasbeen etched to form the pattern as shown, indicated by reference numeral41. In this illustration, this patterned layer does not include a heaterlayer element 10, and in this sense has no heater functionality.However, this layer of heater material does assist in reducing theresistance of the electrodes 15 of the heater 14 so that, in operation,less energy is consumed by the electrodes which allows greater energyconsumption by, and therefore greater effectiveness of, the heaterelements 10. In the dual heater embodiment illustrated in FIG. 38, thecorresponding layer 40 does contain a heater 14.

FIG. 21 shows the stage of production after a third layer 42, ofsacrificial resist, has been deposited. As the uppermost level of thislayer will constitute the inner surface of the nozzle plate 2 to beformed later, and hence the inner extent of the nozzle aperture 5, theheight of this layer 42 must be sufficient to allow for the formation ofa bubble 12 in the region designated 43 during operation of theprinthead.

FIG. 23 shows the stage of production after the roof layer 44 has beendeposited, that is, the layer which will constitute the nozzle plate 2.Instead of being formed from 100 micron thick polyimide film, the nozzleplate 2 is formed of silicon nitride, just 2 microns thick.

FIG. 24 shows the stage of production after the chemical vapordeposition (CVD) of silicon nitride forming the layer 44, has beenpartly etched at the position designated 45, so as to form the outsidepart of the nozzle rim 4, this outside part being designated 4.1

FIG. 26 shows the stage of production after the CVD of silicon nitridehas been etched all the way through at 46, to complete the formation ofthe nozzle rim 4 and to form the nozzle aperture 5, and after the CVDsilicon nitride has been removed at the position designated 47 where itis not required.

FIG. 28 shows the stage of production after a protective layer 48 ofresist has been applied. After this stage, the substrate portion 21 isthen ground from its other side (not shown) to reduce the substrateportion from its nominal thickness of about 800 microns to about 200microns, and then, as foreshadowed above, to etch the hole 32. The hole32 is etched to a depth such that it meets the hole 31.

Then, the sacrificial resist of each of the resist layers 35, 39, 42 and48, is removed using oxygen plasma, to form the structure shown in FIG.30, with walls 6 and nozzle plate 2 which together define the chamber 7(part of the walls and nozzle plate being shown cut-away). It will benoted that this also serves to remove the resist filling the hole 31 sothat this hole, together with the hole 32 (not shown in FIG. 30), definea passage extending from the lower side of the substrate portion 21 tothe nozzle 3, this passage serving as the ink inlet passage, generallydesignated 9, to the chamber 7.

While the above production process is used to produce the embodiment ofthe printhead shown in FIG. 30, further printhead embodiments, havingdifferent heater structures, are shown in FIG. 33, FIGS. 35 and 37, andFIGS. 38 and 40.

Control of Ink Drop Ejection

Referring once again to FIG. 30, the unit cell 1 shown, as mentionedabove, is shown with part of the walls 6 and nozzle plate 2 cut-away,which reveals the interior of the chamber 7. The heater 14 is not showncut away, so that both halves of the heater element 10 can be seen.

In operation, ink 11 passes through the ink inlet passage 9 (see FIG.28) to fill the chamber 7. Then a voltage is applied across theelectrodes 15 to establish a flow of electric current through the heaterelement 10. This heats the element 10, as described above in relation toFIG. 1, to form a vapor bubble in the ink within the chamber 7.

The various possible structures for the heater 14, some of which areshown in FIGS. 33, 35 and 37, and 38, can result in there being manyvariations in the ratio of length to width of the heater elements 10.Such variations (even though the surface area of the elements 10 may bethe same) may have significant effects on the electrical resistance ofthe elements, and therefore on the balance between the voltage andcurrent to achieve a certain power of the element.

Modern drive electronic components tend to require lower drive voltagesthan earlier versions, with lower resistances of drive transistors intheir “on” state. Thus, in such drive transistors, for a giventransistor area, there is a tendency to higher current capability andlower voltage tolerance in each process generation.

FIG. 36, referred to above, shows the shape, in plan view, of a mask forforming the heater structure of the embodiment of the printhead shown inFIG. 35. Accordingly, as FIG. 36 represents the shape of the heaterelement 10 of that embodiment, it is now referred to in discussing thatheater element. During operation, current flows vertically into theelectrodes 15 (represented by the parts designated 15.36), so that thecurrent flow area of the electrodes is relatively large, which, in turn,results in there being a low electrical resistance. By contrast, theelement 10, represented in FIG. 36 by the part designated 10.36, is longand thin, with the width of the element in this embodiment being 1micron and the thickness being 0.25 microns.

It will be noted that the heater 14 shown in FIG. 33 has a significantlysmaller element 10 than the element 10 shown in FIG. 35, and has just asingle loop 36. Accordingly, the element 10 of FIG. 33 will have a muchlower electrical resistance, and will permit a higher current flow, thanthe element 10 of FIG. 35. It therefore requires a lower drive voltageto deliver a given energy to the heater 14 in a given time.

In FIG. 38, on the other hand, the embodiment shown includes a heater 14having two heater elements 10.1 and 10.2 corresponding to the same unitcell 1. One of these elements 10.2 is twice the width as the otherelement 10.1, with a correspondingly larger surface area. The variouspaths of the lower element 10.2 are 2 microns in width, while those ofthe upper element 10.1 are 1 micron in width. Thus the energy applied toink in the chamber 7 by the lower element 10.2 is twice that applied bythe upper element 10.1 at a given drive voltage and pulse duration. Thispermits a regulating of the size of vapor bubbles and hence of the sizeof ink drop ejected due to the bubbles.

Assuming that the energy applied to the ink by the upper element 10.1 isX, it will be appreciated that the energy applied by the lower element10.2 is about 2X, and the energy applied by the two elements together isabout 3X. Of course, the energy applied when neither element isoperational, is zero. Thus, in effect, two bits of information can beprinted with the one nozzle 3.

As the above factors of energy output may not be achieved exactly inpractice, some “fine tuning” of the exact sizing of the elements 10.1and 10.2, or of the drive voltages that are applied to them, may berequired.

It will also be noted that the upper element 10.1 is rotated through180° about a vertical axis relative to the lower element 10.2. This isso that their electrodes 15 are not coincident, allowing independentconnection to separate drive circuits.

FEATURES AND ADVANTAGES OF PARTICULAR EMBODIMENTS

Discussed below, under appropriate headings, are certain specificfeatures of embodiments of the invention, and the advantages of thesefeatures. The features are to be considered in relation to all of thedrawings pertaining to the present invention unless the contextspecifically excludes certain drawings, and relates to those drawingsspecifically referred to.

Suspended Beam Heater

With reference to FIG. 1, and as mentioned above, the heater element 10is in the form of a suspended beam, and this is suspended over at leasta portion (designated 11.1) of the ink 11 (bubble forming liquid). Theelement 10 is configured in this way rather than forming part of, orbeing embedded in, a substrate as is the case in existing printheadsystems made by various manufacturers such as Hewlett Packard, Canon andLexmark. This constitutes a significant difference between embodimentsof the present invention and the prior ink jet technologies.

The main advantage of this feature is that a higher efficiency can beachieved by avoiding the unnecessary heating of the solid material thatsurrounds the heater elements 10 (for example the solid material formingthe chamber walls 6, and surrounding the inlet passage 9) which takesplace in the prior art devices. The heating of such solid material doesnot contribute to the formation of vapor bubbles 12, so that the heatingof such material involves the wastage of energy. The only energy whichcontributes in any significant sense to the generation of the bubbles 12is that which is applied directly into the liquid which is to be heated,which liquid is typically the ink 11.

In one preferred embodiment, as illustrated in FIG. 1, the heaterelement 10 is suspended within the ink 11 (bubble forming liquid), sothat this liquid surrounds the element. This is further illustrated inFIG. 41. In another possible embodiment, as illustrated in FIG. 42, theheater element 10 beam is suspended at the surface of the ink (bubbleforming liquid) 11, so that this liquid is only below the element ratherthan surrounding it, and there is air on the upper side of the element.The embodiment described in relation to FIG. 41 is preferred as thebubble 12 will form all around the element 10 unlike in the embodimentdescribed in relation to FIG. 42 where the bubble will only form belowthe element. Thus the embodiment of FIG. 41 is likely to provide a moreefficient operation.

As can be seen in, for example, with reference to FIGS. 30 and 31, theheater element 10 beam is supported only on one side and is free at itsopposite side, so that it constitutes a cantilever.

Efficiency of the Printhead

The feature presently under consideration is that the heater element 10is configured such that an energy of less than 500 nanojoules (nJ) isrequired to be applied to the element to heat it sufficiently to form abubble 12 in the ink 11, so as to eject a drop 16 of ink through anozzle 3.

In one preferred embodiment, the required energy is less that 300 nJ,while in a further embodiment, the energy is less than 120 nJ.

It will be appreciated by those skilled in the art that prior artdevices generally require over 5 microjoules to heat the elementsufficiently to generate a vapor bubble 12 to eject an ink drop 16.Thus, the energy requirements of the present invention are an order ofmagnitude lower than that of known thermal ink jet systems. This lowerenergy consumption allows lower operating costs, smaller power supplies,and so on, but also dramatically simplifies printhead cooling, allowshigher densities of nozzles 3, and permits printing at higherresolutions.

These advantages of the present invention are especially significant inembodiments where the individual ejected ink drops 16, themselves,constitute the major cooling mechanism of the printhead, as describedfurther below.

Self-Cooling of the Printhead

This feature of the invention provides that the energy applied to aheater element 10 to form a vapor bubble 12 so as to eject a drop 16 ofink 11 is removed from the printhead by a combination of the heatremoved by the ejected drop itself, and the ink that is taken into theprinthead from the ink reservoir (not shown). The result of this is thatthe net “movement” of heat will be outwards from the printhead, toprovide for automatic cooling. Under these circumstances, the printheaddoes not require any other cooling systems.

As the ink drop 16 ejected and the amount of ink 11 drawn into theprinthead to replace the ejected drop are constituted by the same typeof liquid, and will essentially be of the same mass, it is convenient toexpress the net movement of energy as, on the one hand, the energy addedby the heating of the element 10, and on the other hand, the net removalof heat energy that results from ejecting the ink drop 16 and the intakeof the replacement quantity of ink 11. Assuming that the replacementquantity of ink 11 is at ambient temperature, the change in energy dueto net movement of the ejected and replacement quantities of ink canconveniently be expressed as the heat that would be required to raisethe temperature of the ejected drop 16, if it were at ambienttemperature, to the actual temperature of the drop as it is ejected.

It will be appreciated that a determination of whether the abovecriteria are met depends on what constitutes the ambient temperature. Inthe present case, the temperature that is taken to be the ambienttemperature is the temperature at which ink 11 enters the printhead fromthe ink storage reservoir (not shown) which is connected, in fluid flowcommunication, to the inlet passages 9 of the printhead. Typically theambient temperature will be the room ambient temperature, which isusually roughly 20 degrees C. (Celsius).

However, the ambient temperature may be less, if for example, the roomtemperature is lower, or if the ink 11 entering the printhead isrefrigerated.

In one preferred embodiment, the printhead is designed to achievecomplete self-cooling (i.e. where the outgoing heat energy due to thenet effect of the ejected and replacement quantities of ink 11 is equalto the heat energy added by the heater element 10).

By way of example, assuming that the ink 11 is the bubble forming liquidand is water based, thus having a boiling point of approximately 100degrees C., and if the ambient temperature is 40 degrees C., then thereis a maximum of 60 degrees C. from the ambient temperature to the inkboiling temperature and that is the maximum temperature rise that theprinthead could undergo.

It is desirable to avoid having ink temperatures within the printhead(other than at time of ink drop 16 ejection) which are very close to theboiling point of the ink 11. If the ink 11 were at such a temperature,then temperature variations between parts of the printhead could resultin some regions being above boiling point, with the unintended, andtherefore undesirable, formation of vapor bubbles 12. Accordingly, apreferred embodiment of the invention is configured such that completeself-cooling, as described above, can be achieved when the maximumtemperature of the ink 11 (bubble forming liquid) in a particular nozzlechamber 7 is 10 degrees C. below its boiling point when the heatingelement 10 is not active.

The main advantage of the feature presently under discussion, and itsvarious embodiments, is that it allows for a high nozzle density and fora high speed of printhead operation without requiring elaborate coolingmethods for preventing undesired boiling in nozzles 3 adjacent tonozzles from which ink drops 16 are being ejected. This can allow asmuch as a hundred-fold increase in nozzle packing density than would bethe case if such a feature, and the temperature criteria mentioned, werenot present.

Areal Density of Nozzles

This feature of the invention relates to the density, by area, of thenozzles 3 on the printhead. With reference to FIG. 1, the nozzle plate 2has an upper surface 50, and the present aspect of the invention relatesto the packing density of nozzles 3 on that surface. More specifically,the areal density of the nozzles 3 on that surface 50 is over 10,000nozzles per square cm of surface area.

In one preferred embodiment, the areal density exceeds 20,000 nozzles 3per square cm of surface 50 area, while in another preferred embodiment,the areal density exceeds 40,000 nozzles 3 per square cm. In a preferredembodiment, the areal density is 48828 nozzles 3 per square cm.

When referring to the areal density, each nozzle 3 is taken to includethe drive-circuitry corresponding to the nozzle, which consists,typically, of a drive transistor, a shift register, an enable gate andclock regeneration circuitry (this circuitry not being specificallyidentified).

With reference to FIG. 43 in which a single unit cell 1 is shown, thedimensions of the unit cell are shown as being 32 microns in width by 64microns in length. The nozzle 3 of the next successive row of nozzles(not shown) immediately juxtaposes this nozzle, so that, as a result ofthe dimension of the outer periphery of the printhead chip, there are48,828 nozzles 3 per square cm. This is about 85 times the nozzle arealdensity of a typical thermal ink jet printhead, and roughly 400 timesthe nozzle areal density of a piezoelectric printhead.

The main advantage of a high areal density is low manufacturing cost, asthe devices are batch fabricated on silicon wafers of a particular size.

The more nozzles 3 that can be accommodated in a square cm of substrate,the more nozzles can be fabricated in a single batch, which typicallyconsists of one wafer. The cost of manufacturing a CMOS plus MEMS waferof the type used in the printhead of the present invention is, to a someextent, independent of the nature of patterns that are formed on it.Therefore if the patterns are relatively small, a relatively largenumber of nozzles 3 can be included. This allows more nozzles 3 and moreprintheads to be manufactured for the same cost than in a cases wherethe nozzles had a lower areal density. The cost is directly proportionalto the area taken by the nozzles 3.

Bubble Formation on Opposite Sides of Heater Element

According to the present feature, the heater 14 is configured so thatwhen a bubble 12 forms in the ink 11 (bubble forming liquid), it formson both sides of the heater element 10. Preferably, it forms so as tosurround the heater element 10 where the element is in the form of asuspended beam.

The formation of a bubble 12 on both sides of the heater element 10 asopposed to on one side only, can be understood with reference to FIGS.45 and 46. In the first of these figures, the heater element 10 isadapted for the bubble 12 to be formed only on one side as, while in thesecond of these figures, the element is adapted for the bubble 12 to beformed on both sides, as shown.

In a configuration such as that of FIG. 45, the reason that the bubble12 forms on only one side of the heater element 10 is because theelement is embedded in a substrate 51, so that the bubble cannot beformed on the particular side corresponding to the substrate. Bycontrast, the bubble 12 can form on both sides in the configuration ofFIG. 46 as the heater element 10 here is suspended.

Of course where the heater element 10 is in the form of a suspended beamas described above in relation to FIG. 1, the bubble 12 is allowed toform so as to surround the suspended beam element.

The advantage of the bubble 12 forming on both sides is the higherefficiency that is achievable. This is due to a reduction in heat thatis wasted in heating solid materials in the vicinity of the heaterelement 10, which do not contribute to formation of a bubble 12. This isillustrated in FIG. 45, where the arrows 52 indicate the movements ofheat into the solid substrate 51. The amount of heat lost to thesubstrate 51 depends on the thermal conductivity of the solid materialsof the substrate relative to that of the ink 11, which may be waterbased. As the thermal conductivity of water is relatively low, more thanhalf of the heat can be expected to be absorbed by the substrate 51rather than by the ink 11.

Prevention of Cavitation

As described above, after a bubble 12 has been formed in a printheadaccording to an embodiment of the present invention, the bubblecollapses towards a point of collapse 17. According to the featurepresently being addressed, the heater elements 10 are configured to formthe bubbles 12 so that the points of collapse 17 towards which thebubbles collapse, are at positions spaced from the heater elements.Preferably, the printhead is configured so that there is no solidmaterial at such points of collapse 17. In this way cavitation, being amajor problem in prior art thermal ink jet devices, is largelyeliminated.

Referring to FIG. 48, in a preferred embodiment, the heater elements 10are configured to have parts 53 which define gaps (represented by thearrow 54), and to form the bubbles 12 so that the points of collapse 17to which the bubbles collapse are located at such gaps. The advantage ofthis feature is that it substantially avoids cavitation damage to theheater elements 10 and other solid material.

In a standard prior art system as shown schematically in FIG. 47, theheater element 10 is embedded in a substrate 55, with an insulatinglayer 56 over the element, and a protective layer 57 over the insulatinglayer. When a bubble 12 is formed by the element 10, it is formed on topof the element. When the bubble 12 collapses, as shown by the arrows 58,all of the energy of the bubble collapse is focussed onto a very smallpoint of collapse 17. If the protective layer 57 were absent, then themechanical forces due to the cavitation that would result from thefocussing of this energy to the point of collapse 17, could chip away orerode the heater element 10. However, this is prevented by theprotective layer 57.

Typically, such a protective layer 57 is of tantalum, which oxidizes toform a very hard layer of tantalum pentoxide (Ta₂O₅). Although no knownmaterials can fully resist the effects of cavitation, if the tantalumpentoxide should be chipped away due to the cavitation, then oxidationwill again occur at the underlying tantalum metal, so as to effectivelyrepair the tantalum pentoxide layer.

Although the tantalum pentoxide functions relatively well in this regardin known thermal ink jet systems, it has certain disadvantages. Onesignificant disadvantage is that, in effect, virtually the wholeprotective layer 57 (having a thickness indicated by the referencenumeral 59) must be heated in order to transfer the required energy intothe ink 11, to heat it so as to form a bubble 12. This layer 57 has ahigh thermal mass due to the very high atomic weight of the tantalum,and this reduces the efficiency of the heat transfer. Not only does thisincrease the amount of heat which is required at the level designated 59to raise the temperature at the level designated 60 sufficiently to heatthe ink 11, but it also results in a substantial thermal loss to takeplace in the directions indicated by the arrows 61. These disadvantagewould not be present if the heater element 10 was merely supported on asurface and was not covered by the protective layer 57.

According to the feature presently under discussion, the need for aprotective layer 57, as described above, is avoided by generating thebubble 12 so that it collapses, as illustrated in FIG. 48, towards apoint of collapse 17 at which there is no solid material, and moreparticularly where there is the gap 54 between parts 53 of the heaterelement 10. As there is merely the ink 11 itself in this location (priorto bubble generation), there is no material that can be eroded here bythe effects of cavitation. The temperature at the point of collapse 17may reach many thousands of degrees C., as is demonstrated by thephenomenon of sonoluminesence. This will break down the ink componentsat that point. However, the volume of extreme temperature at the pointof collapse 17 is so small that the destruction of ink components inthis volume is not significant.

The generation of the bubble 12 so that it collapses towards a point ofcollapse 17 where there is no solid material can be achieved usingheater elements 10 corresponding to that represented by the part 10.34of the mask shown in FIG. 34. The element represented is symmetrical,and has a hole represented by the reference numeral 63 at its center.When the element is heated, the bubble forms around the element (asindicated by the dashed line 64) and then grows so that, instead ofbeing of annular (doughnut) shape as illustrated by the dashed lines 64and 65) it spans the element including the hole 63, the hole then beingfilled with the vapor that forms the bubble. The bubble 12 is thussubstantially disc-shaped. When it collapses, the collapse is directedso as to minimize the surface tension surrounding the bubble 12. Thisinvolves the bubble shape moving towards a spherical shape as far as ispermitted by the dynamics that are involved. This, in turn, results inthe point of collapse being in the region of the hole 63 at the centerof the heater element 10, where there is no solid material.

The heater element 10 represented by the part 10.31 of the mask shown inFIG. 31 is configured to achieve a similar result, with the bubblegenerating as indicated by the dashed line 66, and the point of collapseto which the bubble collapses being in the hole 67 at the center of theelement.

The heater element 10 represented as the part 10.36 of the mask shown inFIG. 36 is also configured to achieve a similar result. Where theelement 10.36 is dimensioned such that the hole 68 is small,manufacturing inaccuracies of the heater element may affect the extentto which a bubble can be formed such that its point of collapse is inthe region defined by the hole. For example, the hole may be as littleas a few microns across. Where high levels of accuracy in the element10.36 cannot be achieved, this may result in bubbles represented as12.36 that are somewhat lopsided, so that they cannot be directedtowards a point of collapse within such a small region. In such a case,with regard to the heater element represented in FIG. 36, the centralloop 49 of the element can simply be omitted, thereby increasing thesize of the region in which the point of collapse of the bubble is tofall.

Chemical Vapor Deposited Nozzle Plate, and Thin Nozzle Plates

The nozzle aperture 5 of each unit cell 1 extends through the nozzleplate 2, the nozzle plate thus constituting a structure which is formedby chemical vapor deposition (CVD). In various preferred embodiments,the CVD is of silicon nitride, silicon dioxide or oxi-nitride.

The advantage of the nozzle plate 2 being formed by CVD is that it isformed in place without the requirement for assembling the nozzle plateto other components such as the walls 6 of the unit cell 1. This is animportant advantage because the assembly of the nozzle plate 2 thatwould otherwise be required can be difficult to effect and can involvepotentially complex issues. Such issues include the potential mismatchof thermal expansion between the nozzle plate 2 and the parts to whichit would be assembled, the difficulty of successfully keeping componentsaligned to each other, keeping them planar, and so on, during the curingprocess of the adhesive which bonds the nozzle plate 2 to the otherparts.

The issue of thermal expansion is a significant factor in the prior art,which limits the size of ink jets that can be manufactured. This isbecause the difference in the coefficient of thermal expansion between,for example, a nickel nozzle plate and a substrate to which the nozzleplate is connected, where this substrate is of silicon, is quitesubstantial. Consequently, over as small a distance as that occupied by,say, 1000 nozzles, the relative thermal expansion that occurs betweenthe respective parts, in being heated from the ambient temperature tothe curing temperature required for bonding the parts together, cancause a dimension mismatch of significantly greater than a whole nozzlelength. This would be significantly detrimental for such devices.

Another problem addressed by the features of the invention presentlyunder discussion, at least in embodiments thereof, is that, in prior artdevices, nozzle plates that need to be assembled are generally laminatedonto the remainder of the printhead under conditions of relatively highstress. This can result in breakages or undesirable deformations of thedevices. Also, by forming the nozzle plate in-situ on the wafersubstrate, there is no need to assemble the plate and the etched wafer.Such assembly involves a precision alignment of the nozzle plate usingcustom equipment. The depositing of the nozzle plate 2 by CVD inembodiments of the present invention avoids this.

A further advantage of the present features of the invention, at leastin embodiments thereof, is their compatibility with existingsemiconductor manufacturing processes. Depositing a nozzle plate 2 byCVD allows the nozzle plate to be included in the printhead at the scaleof normal silicon wafer production, using processes normally used forsemi-conductor manufacture. Standard lithographic equipment used in themodern semiconductor industry provides a high throughput as well as ahigh degree of accuracy.

Existing thermal ink jet or bubble jet systems experience pressuretransients, during the bubble generation phase, of up to 100atmospheres. If the nozzle plates 2 in such devices were applied by CVD,then to withstand such pressure transients, a substantial thickness ofCVD nozzle plate would be required. As would be understood by thoseskilled in the art, such thicknesses of deposited nozzle plates wouldgive rise certain problems as discussed below.

For example, the thickness of nitride sufficient to withstand a 100atmosphere pressure in the nozzle chamber 7 may be, say, 10 microns.With reference to FIG. 49, which shows a unit cell 1 that is not inaccordance with the present invention, and which has such a thick nozzleplate 2, it will be appreciated that such a thickness can result inproblems relating to drop ejection. In this case, due to the thicknessof nozzle plate 2, the fluidic drag exerted by the nozzle 3 as the ink11 is ejected therethrough results in significant losses in theefficiency of the device.

Another problem that would exist in the case of such a thick nozzleplate 2, relates to the actual etching process. This is assuming thatthe nozzle 3 is etched, as shown, perpendicular to the wafer 8 of thesubstrate portion, for example using a standard plasma etching. Thiswould typically require more than 10 microns of resist 69 to be applied.To expose that thickness of resist 69, the required level of resolutionbecomes difficult to achieve, as the focal depth of the stepper that isused to expose the resist is relatively small. Although it would bepossible to expose this relevant depth of resist 69 using x-rays, thiswould be a relatively costly process.

A further problem that would exist with such a thick nozzle plate 2 in acase where a 10 micron thick layer of nitride were CVD deposited on asilicon substrate wafer, is that, because of the difference in thermalexpansion between the CVD layer and the substrate, as well as theinherent stress of within thick deposited layer, the wafer could becaused to bow to such a degree that further steps in the lithographicprocess would become impractical. Thus, a layer for the nozzle plate 2as thick as 10 microns (unlike in the present invention), whilepossible, is disadvantageous.

With reference to FIG. 50, in a Memjet thermal ink ejection deviceaccording to an embodiment of the present invention, the CVD nitridenozzle plate layer 2 is only 2 microns thick. Therefore the fluidic dragthrough the nozzle 3 is not particularly significant and is thereforenot a major cause of loss.

Furthermore, the etch time, and the resist thickness required to etchnozzles 3 in such a nozzle plate 2, and the stress on the substratewafer 8, will not be excessive.

The relatively thin nozzle plate 2 in this invention is enabled as thepressure generated in the chamber 7 is only approximately 1 atmosphereand not 100 atmospheres as in prior art devices, as mentioned above.

There are many factors which contribute to the significant reduction inpressure transient required to eject drops 16 in this system. Theseinclude:

1. small size of chamber 7;

2. accurate fabrication of nozzle 3 and chamber 7;

3. stability of drop ejection at low drop velocities;

4. very low fluidic and thermal crosstalk between nozzles 3;

5. optimum nozzle size to bubble area;

6. low fluidic drag through thin (2 micron) nozzle 3;

7. low pressure loss due to ink ejection through the inlet 9;

8. self-cooling operation.

As mentioned above in relation the process described in terms of FIGS. 6to 31, the etching of the 2-micron thick nozzle plate layer 2 involvestwo relevant stages. One such stage involves the etching of the regiondesignated 45 in FIGS. 24 and 50, to form a recess outside of what willbecome the nozzle rim 4. The other such stage involves a further etch,in the region designated 46 in FIGS. 26 and 50, which actually forms thenozzle aperture 5 and finishes the rim 4.

Nozzle Plate Thicknesses

As addressed above in relation to the formation of the nozzle plate 2 byCVD, and with the advantages described in that regard, the nozzle platesin the present invention are thinner than in the prior art. Moreparticularly, the nozzle plates 2 are less than 10 microns thick. In onepreferred embodiment, the nozzle plate 2 of each unit cell 1 is lessthan 5 microns thick, while in another preferred embodiment, it is lessthan 2.5 microns thick. Indeed, a preferred thickness for the nozzleplate 2 is 2 microns thick.

Heater Elements Formed in Different Layers

According to the present feature, there are a plurality of heaterelements 10 disposed within the chamber 7 of each unit cell 1. Theelements 10, which are formed by the lithographic process as describedabove in relation to FIGS. 6 to 31, are formed in respective layers.

In preferred embodiments, as shown in FIGS. 38, 40 and 51, the heaterelements 10.1 and 10.2 in the chamber 7, are of different sizes relativeto each other.

Also as will be appreciated with reference to the above description ofthe lithographic process, each heater element 10.1, 10.2 is formed by atleast one step of that process, the lithographic steps relating to eachone of the elements 10.1 being distinct from those relating to the otherelement 10.2.

The elements 10.1, 10.2 are preferably sized relative to each other, asreflected schematically in the diagram of FIG. 51, such that they canachieve binary weighted ink drop volumes, that is, so that they cancause ink drops 16 having different, binary weighted volumes to beejected through the nozzle 3 of the particular unit cell 1. Theachievement of the binary weighting of the volumes of the ink drops 16is determined by the relative sizes of the elements 10.1 and 10.2. InFIG. 51, the area of the bottom heater element 10.2 in contact with theink 11 is twice that of top heater element 10.1.

One known prior art device, patented by Canon, and illustratedschematically in FIG. 52, also has two heater elements 10.1 and 10.2 foreach nozzle, and these are also sized on a binary basis (i.e. to producedrops 16 with binary weighted volumes). These elements 10.1, 10.2 areformed in a single layer, adjacent to each other in the nozzle chamber7. It will be appreciated that the bubble 12.1 formed by the smallelement 10.1, only, is relatively small, while that 12.2 formed by thelarge element 10.2, only, is relatively large. The bubble generated bythe combined effects of the two elements, when they are actuatedsimultaneously, is designated 12.3. Three differently sized ink drops 16will be caused to be ejected by the three respective bubbles 12.1, 12.2and 12.3.

It will be appreciated that the size of the elements 10.1 and 10.2themselves are not required to be binary weighted to cause the ejectionof drops 16 having different sizes or the ejection of usefulcombinations of drops. Indeed, the binary weighting may well not berepresented precisely by the area of the elements 10.1, 10.2 themselves.In sizing the elements 10.1, 10.2 to achieve binary weighted dropvolumes, the fluidic characteristics surrounding the generation ofbubbles 12, the drop dynamics characteristics, the quantity of liquidthat is drawing back into the chamber 7 from the nozzle 3 once a drop 16has broken off, and so forth, must be considered. Accordingly, theactual ratio of the surface areas of the elements 10.1, 10.2, or theperformance of the two heaters, needs to be adjusted in practice toachieve the desired binary weighted drop volumes.

Where the size of the heater elements 10.1, 10.2 is fixed and where theratio of their surface areas is therefore fixed, the relative sizes ofejected drops 16 may be adjusted by adjusting the supply voltages to thetwo elements. This can also be achieved by adjusting the duration of theoperation pulses of the elements 10.1, 10.2—i.e. their pulse widths.However, the pulse widths cannot exceed a certain amount of time,because once a bubble 12 has nucleated on the surface of an element10.1, 10.2, then any duration of pulse width after that time will be oflittle or no effect.

On the other hand, the low thermal mass of the heater elements 10.1,10.2 allows them to be heated to reach, very quickly, the temperature atwhich bubbles 12 are formed and at which drops 16 are ejected. While themaximum effective pulse width is limited, by the onset of bubblenucleation, typically to around 0.5 microseconds, the minimum pulsewidth is limited only by the available current drive and the currentdensity that can be tolerated by the heater elements 10.1, 10.2.

As shown in FIG. 51, the two heaters elements 10.1, 10.2 are connectedto two respective drive circuits 70. Although these circuits 70 may beidentical to each other, a further adjustment can be effected by way ofthese circuits, for example by sizing the drive transistor (not shown)connected to the lower element 10.2, which is the high current element,larger than that connected to the upper element 10.1. If, for example,the relative currents provided to the respective elements 10.1, 10.2 arein the ratio 2:1, the drive transistor of the circuit 70 connected tothe lower element 10.2 would typically be twice the width of the drivetransistor (also no shown) of the circuit 70 connected to the otherelement 10.1.

In the prior art described in relation to FIG. 52, the heater elements10.1, 10.2, which are in the same layer, are produced simultaneously inthe same step of the lithographic manufacturing process. In theembodiment of the present invention illustrated in FIG. 51, the twoheaters elements 10.1, 10.2, as mentioned above, are formed one afterthe other. Indeed, as described in the process illustrated withreference to FIGS. 6 to 31, the material to form the element 10.2 isdeposited and is then etched in the lithographic process, whereafter asacrificial layer 39 is deposited on top of that element, and then thematerial for the other element 10.1 is deposited so that the sacrificiallayer is between the two heater element layers. The layer of the secondelement 10.1 is etched by a second lithographic step, and thesacrificial layer 39 is removed.

Referring once again to the different sizes of the heater elements 10.1and 10.2, as mentioned above, this has the advantage that it enables theelements to be sized so as to achieve multiple, binary weighted dropvolumes from one nozzle 3.

It will be appreciated that, where multiple drop volumes can beachieved, and especially if they are binary weighted, then photographicquality can be obtained while using fewer printed dots, and at a lowerprint resolution.

Furthermore, under the same circumstances, higher speed printing can beachieved. That is, instead of just ejecting one drop 14 and then waitingfor the nozzle 3 to refill, the equivalent of one, two, or three dropsmight be ejected. Assuming that the available refill speed of the nozzle3 is not a limiting factor, ink ejection, and hence printing, up tothree times faster, may be achieved. In practice, however, the nozzlerefill time will typically be a limiting factor. In this case, thenozzle 3 will take slightly longer to refill when a triple volume ofdrop 16 (relative to the minimum size drop) has been ejected than whenonly a minimum volume drop has been ejected. However, in practice itwill not take as much as three times as long to refill. This is due tothe inertial dynamics and the surface tension of the ink 11.

Referring to FIG. 53, there is shown, schematically, a pair of adjacentunit cells 1.1 and 1.2, the cell on the left 1.1 representing the nozzle3 after a larger volume of drop 16 has been ejected, and that on theright 1.2, after a drop of smaller volume has been ejected. In the caseof the larger drop 16, the curvature of the air bubble 71 that hasformed inside the partially emptied nozzle 3.1 is larger than in thecase of air bubble 72 that has formed after the smaller volume drop hasbeen ejected from the nozzle 3.2 of the other unit cell 1.2.

The higher curvature of the air bubble 71 in the unit cell 1.1 resultsin a greater surface tension force which tends to draw the ink 11, fromthe refill passage 9 towards the nozzle 3 and into the chamber 7.1, asindicated by the arrow 73. This gives rise to a shorter refilling time.As the chamber 7.1 refills, it reaches a stage, designated 74, where thecondition is similar to that in the adjacent unit cell 1.2. In thiscondition, the chamber 7.1 of the unit cell 1.1 is partially refilledand the surface tension force has therefore reduced. This results in therefill speed slowing down even though, at this stage, when thiscondition is reached in that unit cell 1.1, a flow of liquid into thechamber 7.1, with its associated momentum, has been established. Theoverall effect of this is that, although it takes longer to completelyfill the chamber 7.1 and nozzle 3.1 from a time when the air bubble 71is present than from when the condition 74 is present, even if thevolume to be refilled is three times larger, it does not take as much asthree times longer to refill the chamber 7.1 and nozzle 3.1.

Heater Elements Formed from Materials Constituted by Elements with LowAtomic-Numbers

This feature involves the heater elements 10 being formed of solidmaterial, at least 90% of which, by weight, is constituted by one ormore periodic elements having an atomic number below 50. In a preferredembodiment the atomic weight is below 30, while in another embodimentthe atomic weight is below 23.

The advantage of a low atomic number is that the atoms of that materialhave a lower mass, and therefore less energy is required to raise thetemperature of the heater elements 10. This is because, as will beunderstood by those skilled in the art, the temperature of an article isessentially related to the state of movement of the nuclei of the atoms.Accordingly, it will require more energy to raise the temperature, andthereby induce such a nucleus movement, in a material with atoms havingheavier nuclei that in a material having atoms with lighter nuclei.

Materials currently used for the heater elements of thermal ink jetsystems include tantalum aluminum alloy (for example used by HewlettPackard), and hafnium boride (for example used by Canon). Tantalum andhafnium have atomic numbers 73 and 72, respectively, while the materialused in the Memjet heater elements 10 of the present invention istitanium nitride. Titanium has an atomic number of 22 and nitrogen hasan atomic number of 7, these materials therefore being significantlylighter than those of the relevant prior art device materials.

Boron and aluminum, which form part of hafnium boride and tantalumaluminum, respectively, like nitrogen, are relatively light materials.However, the density of tantalum nitride is 16.3 g/cm³, while that oftitanium nitride (which includes titanium in place of tantalum) is 5.22g/cm³. Thus, because tantalum nitride has a density of approximatelythree times that of the titanium nitride, titanium nitride will requireapproximately three time less energy to heat than tantalum nitride. Aswill be understood by a person skilled in the art, the difference inenergy in a material at two different temperatures is represented by thefollowing equation:

E=ΔT×C _(p)×VOL×p,

where ΔT represents the temperature difference, C_(p) is the specificheat capacity, VOL is the volume, and ρ is the density of the material.Although the density is not determined only by the atomic numbers as itis also a function of the lattice constants, the density is stronglyinfluenced by the atomic numbers of the materials involved, and hence isa key aspect of the feature under discussion.

Low Heater Mass

This feature involves the heater elements 10 being configured such thatthe mass of solid material of each heater element that is heated abovethe boiling point of the bubble forming liquid (i.e. the ink 11 in thisembodiment) to heat the ink so as to generate bubbles 12 therein tocause an ink drop 16 to be ejected, is less than 10 nanograms.

In one preferred embodiment, the mass is less that 2 nanograms, inanother embodiment the mass is less than 500 picograms, and in yetanother embodiment the mass is less than 250 picograms.

The above feature constitutes a significant advantage over prior artinkjet systems, as it results in an increased efficiency as a result ofthe reduction in energy lost in heating the solid materials of theheater elements 10. This feature is enabled due to the use of heaterelement materials having low densities, due to the relatively small sizeof the elements 10, and due to the heater elements being in the form ofsuspended beams which are not embedded in other materials, asillustrated, for example, in FIG. 1.

FIG. 34 shows the shape, in plan view, of a mask for forming the heaterstructure of the embodiment of the printhead shown in FIG. 33.Accordingly, as FIG. 34 represents the shape of the heater element 10 ofthat embodiment, it is now referred to in discussing that heaterelement. The heater element as represented by reference numeral 10.34 inFIG. 34 has just a single loop 49 which is 2 microns wide and 0.25microns thick. It has a 6 micron outer radius and a 4 micron innerradius. The total heater mass is 82 picograms. The corresponding element10.2 similarly represented by reference numeral 10.39 in FIG. 39 has amass of 229.6 picograms and that 10 represented by reference numeral10.36 in FIG. 36 has a mass of 225.5 picograms.

When the elements 10, 102 represented in FIGS. 34, 39 and 36, forexample, are used in practice, the total mass of material of each suchelement which is in thermal contact with the ink 11 (being the bubbleforming liquid in this embodiment) that is raised to a temperature abovethat of the boiling point of the ink, will be slightly higher than thesemasses as the elements will be coated with an electrically insulating,chemically inert, thermally conductive material. This coating increases,to some extent, the total mass of material raised to the highertemperature.

Conformally Coated Heater Element

This feature involves each element 10 being covered by a conformalprotective coating, this coating having been applied to all sides of theelement simultaneously so that the coating is seamless. The coating 10,preferably, is electrically non-conductive, is chemically inert and hasa high thermal conductivity. In one preferred embodiment, the coating isof aluminum nitride, in another embodiment it is of diamond-like carbon(DLC), and in yet another embodiment it is of boron nitride.

Referring to FIGS. 54 and 55, there are shown schematic representationsof a prior art heater element 10 that is not conformally coated asdiscussed above, but which has been deposited on a substrate 78 andwhich, in the typical manner, has then been conformally coated on oneside with a CVD material, designated 76. In contrast, the coatingreferred to above in the present instance, as reflected schematically inFIG. 56, this coating being designated 77, involves conformally coatingthe element on all sides simultaneously. However, this conformal coating77 on all sides can only be achieved if the element 10, when being socoated, is a structure isolated from other structures—i.e. in the formof a suspended beam, so that there is access to all of the sides of theelement.

It is to be understood that when reference is made to conformallycoating the element 10 on all sides, this excludes the ends of theelement (suspended beam) which are joined to the electrodes 15 asindicated diagrammatically in FIG. 57. In other words, what is meant byconformally coating the element 10 on all sides is, essentially, thatthe element is fully surrounded by the conformal coating along thelength of the element.

The primary advantage of conformally coating the heater element 10 maybe understood with reference, once again, to FIGS. 54 and 55. As can beseen, when the conformal coating 76 is applied, the substrate 78 onwhich the heater element 10 was deposited (i.e. formed) effectivelyconstitutes the coating for the element on the side opposite theconformally applied coating. The depositing of the conformal coating 76on the heater element 10 which is, in turn, supported on the substrate78, results in a seam 79 being formed. This seam 79 may constitute aweak point, where oxides and other undesirable products might form, orwhere delamination may occur. Indeed, in the case of the heater element10 of FIGS. 54 and 55, where etching is conducted to separate the heaterelement and its coating 76 from the substrate 78 below, so as to renderthe element in the form of a suspended beam, ingress of liquid orhydroxyl ions may result, even though such materials could not penetratethe actual material of the coating 76, or of the substrate 78.

The materials mentioned above (i.e. aluminum nitride or diamond-likecarbon (DLC)) are suitable for use in the conformal coating 77 of thepresent invention as illustrated in FIG. 56 due to their desirably highthermal conductivities, their high level of chemical inertness, and thefact that they are electrically non-conductive. Another suitablematerial, for these purposes, is boron nitride, also referred to above.Although the choice of material used for the coating 77 is important inrelation to achieving the desired performance characteristics, materialsother than those mentioned, where they have suitable characteristics,may be used instead.

Example Printer in Which the Printhead is Used

The components described above form part of a printhead assembly which,in turn, is used in a printer system. The printhead assembly, itself,includes a number of printhead modules 80. These aspects are describedbelow.

Referring briefly to FIG. 44, the array of nozzles 3 shown is disposedon the printhead chip (not shown), with drive transistors, drive shiftregisters, and so on (not shown), included on the same chip, whichreduces the number of connections required on the chip.

With reference to FIGS. 58 and 59, there is shown, in an exploded viewand a non-exploded view, respectively, a printhead module assembly 80which includes a MEMS printhead chip assembly 81 (also referred to belowas a chip). On a typical chip assembly 81 such as that shown, there are7680 nozzles, which are spaced so as to be capable of printing with aresolution of 1600 dots per inch. The chip 81 is also configured toeject 6 different colors or types of ink 11.

A flexible printed circuit board (PCB) 82 is electrically connected tothe chip 81, for supplying both power and data to the chip. The chip 81is bonded onto a stainless-steel upper layer sheet 83, so as to overliean array of holes 84 etched in this sheet. The chip 81 itself is amulti-layer stack of silicon which has ink channels (not shown) in thebottom layer of silicon 85, these channels being aligned with the holes84.

The chip 81 is approximately 1 mm in width and 21 mm in length. Thislength is determined by the width of the field of the stepper that isused to fabricate the chip 81. The sheet 83 has channels 86 (only someof which are shown as hidden detail) which are etched on the undersideof the sheet as shown in FIG. 58. The channels 86 extend as shown sothat their ends align with holes 87 in a mid-layer 88. Different ones ofthe channels 86 align with different ones of the holes 87. The holes 87,in turn, align with channels 89 in a lower layer 90. Each channel 89carries a different respective color of ink, except for the lastchannel, designated 91. This last channel 91 is an air channel and isaligned with further holes 92 in the mid-layer 88, which in turn arealigned with further holes 93 in the upper layer sheet 83. These holes93 are aligned with the inner parts 94 of slots 95 in a top channellayer 96, so that these inner parts are aligned with, and therefore influid-flow communication with, the air channel 91, as indicated by thedashed line 97.

The lower layer 90 has holes 98 opening into the channels 89 and channel91. Compressed filtered air from an air source (not shown) enters thechannel 91 through the relevant hole 98, and then passes through theholes 92 and 93 and slots 95, in the mid layer 88, the sheet 83 and thetop channel layer 96, respectively, and is then blown into the side 99of the chip assembly 81, from where it is forced out, at 100, through anozzle guard 101 which covers the nozzles, to keep the nozzles clear ofpaper dust. Differently colored inks 11 (not shown) pass through theholes 98 of the lower layer 90, into the channels 89, and then throughrespective holes 87, then along respective channels 86 in the undersideof the upper layer sheet 83, through respective holes 84 of that sheet,and then through the slots 95, to the chip 81. It will be noted thatthere are just seven of the holes 98 in the lower layer 90 (one for eachcolor of ink and one for the compressed air) via which the ink and airis passed to the chip 81, the ink being directed to the 7680 nozzles onthe chip.

FIG. 60, in which a side view of the printhead module assembly 80 ofFIGS. 58 and 59 is schematically shown, is now referred to. The centerlayer 102 of the chip assembly is the layer where the 7680 nozzles andtheir associated drive circuitry is disposed. The top layer of the chipassembly, which constitutes the nozzle guard 101, enables the filteredcompressed air to be directed so as to keep the nozzle guard holes 104(which are represented schematically by dashed lines) clear of paperdust.

The lower layer 105 is of silicon and has ink channels etched in it.These ink channels are aligned with the holes 84 in the stainless steelupper layer sheet 83. The sheet 83 receives ink and compressed air fromthe lower layer 90 as described above, and then directs the ink and airto the chip 81. The need to funnel the ink and air from where it isreceived by the lower layer 90, via the mid-layer 88 and upper layer 83to the chip assembly 81, is because it would otherwise be impractical toalign the large number (7680) of very small nozzles 3 with the larger,less accurate holes 98 in the lower layer 90.

The flex PCB 82 is connected to the shift registers and other circuitry(not shown) located on the layer 102 of chip assembly 81. The chipassembly 81 is bonded by wires 106 onto the PCB flex and these wires arethen encapsulated in an epoxy 107. To effect this encapsulating, a dam108 is provided. This allows the epoxy 107 to be applied to fill thespace between the dam 108 and the chip assembly 81 so that the wires 106are embedded in the epoxy. Once the epoxy 107 has hardened, it protectsthe wire bonding structure from contamination by paper and dust, andfrom mechanical contact.

Referring to FIG. 62, there is shown schematically, in an exploded view,a printhead assembly 19, which includes, among other components,printhead module assemblies 80 as described above. The printheadassembly 19 is configured for a page-width printer, suitable for A4 orUS letter type paper.

The printhead assembly 19 includes eleven of the printhead modulesassemblies 80, which are glued onto a substrate channel 110 in the formof a bent metal plate. A series of groups of seven holes each,designated by the reference numerals 111, are provided to supply the 6different colors of ink and the compressed air to the chip assemblies81. An extruded flexible ink hose 112 is glued into place in the channel110. It will be noted that the hose 112 includes holes 113 therein.These holes 113 are not present when the hose 112 is first connected tothe channel 110, but are formed thereafter by way of melting, by forcinga hot wire structure (not shown) through the holes 111, which holes thenserve as guides to fix the positions at which the holes 113 are melted.The holes 113, when the printhead assembly 19 is assembled, are influid-flow communication, via holes 114 (which make up the groups 111 inthe channel 110), with the holes 98 in the lower layer 90 of eachprinthead module assembly 80.

The hose 112 defines parallel channels 115 which extend the length ofthe hose. At one end 116, the hose 112 is connected to ink containers(not shown), and at the opposite end 117, there is provided a channelextrusion cap 118, which serves to plug, and thereby close, that end ofthe hose.

A metal top support plate 119 supports and locates the channel 110 andhose 112, and serves as a back plate for these. The channel 110 and hose112, in turn, exert pressure onto an assembly 120 which includes flexprinted circuits. The plate 119 has tabs 121 which extend throughnotches 122 in the downwardly extending wall 123 of the channel 110, tolocate the channel and plate with respect to each other.

An extrusion 124 is provided to locate copper bus bars 125. Although theenergy required to operate a printhead according to the presentinvention is an order of magnitude lower than that of known thermal inkjet printers, there are a total of about 88,000 nozzles 3 in theprinthead array, and this is approximately 160 times the number ofnozzles that are typically found in typical printheads. As the nozzles 3in the present invention may be operational (i.e. may fire) on acontinuous basis during operation, the total power consumption will bean order of magnitude higher than that in such known printheads, and thecurrent requirements will, accordingly, be high, even though the powerconsumption per nozzle will be an order of magnitude lower than that inthe known printheads. The busbars 125 are suitable for providing forsuch power requirements, and have power leads 126 soldered to them.

Compressible conductive strips 127 are provided to abut with contacts128 on the upperside, as shown, of the lower parts of the flex PCBs 82of the printhead module assemblies 80. The PCBs 82 extend from the chipassemblies 81, around the channel 110, the support plate 119, theextrusion 124 and busbars 126, to a position below the strips 127 sothat the contacts 128 are positioned below, and in contact with, thestrips 127.

Each PCB 82 is double-sided and plated-through. Data connections 129(indicated schematically by dashed lines), which are located on theouter surface of the PCB 82 abut with contact spots 130 (only some ofwhich are shown schematically) on a flex PCB 131 which, in turn,includes a data bus and edge connectors 132 which are formed as part ofthe flex itself. Data is fed to the PCBs 131 via the edge connectors132.

A metal plate 133 is provided so that it, together with the channel 110,can keep all of the components of the printhead assembly 19 together. Inthis regard, the channel 110 includes twist tabs 134 which extendthrough slots 135 in the plate 133 when the assembly 19 is put together,and are then twisted through approximately 45 degrees to prevent themfrom being withdrawn through the slots.

By way of summary, with reference to FIG. 68, the printhead assembly 19is shown in an assembled state. Ink and compressed air are supplied viathe hose 112 at 136, power is supplied via the leads 126, and data isprovided to the printhead chip assemblies 81 via the edge connectors132. The printhead chip assemblies 81 are located on the elevenprinthead module assemblies 80, which include the PCBs 82.

Mounting holes 137 are provided for mounting the printhead assembly 19in place in a printer (not shown). The effective length of the printheadassembly 19, represented by the distance 138, is just over the width ofan A4 page (that is, about 8.5 inches).

Referring to FIG. 69, there is shown, schematically, a cross-sectionthrough the assembled printhead 19. From this, the position of a siliconstack forming a chip assembly 81 can clearly be seen, as can alongitudinal section through the ink and air supply hose 112. Also clearto see is the abutment of the compressible strip 127 which makes contactabove with the busbars 125, and below with the lower part of a flex PCB82 extending from a the chip assembly 81. The twist tabs 134 whichextend through the slots 135 in the metal plate 133 can also be seen,including their twisted configuration, represented by the dashed line139.

Printer System

Referring to FIG. 70, there is shown a block diagram illustrating aprinthead system 140 according to an embodiment of the invention.

Shown in the block diagram is the printhead (represented by the arrow)141, a power supply 142 to the printhead, an ink supply 143, and printdata 144 which is fed to the printhead as it ejects ink, at 145, ontoprint media in the form, for example, of paper 146.

Media transport rollers 147 are provided to transport the paper 146 pastthe printhead 141. A media pick up mechanism 148 is configured towithdraw a sheet of paper 146 from a media tray 149.

The power supply 142 is for providing DC voltage which is a standardtype of supply in printer devices.

The ink supply 143 is from ink cartridges (not shown) and, typicallyvarious types of information will be provided, at 150, about the inksupply, such as the amount of ink remaining This information is providedvia a system controller 151 which is connected to a user interface 152.The interface 152 typically consists of a number of buttons (not shown),such as a “print” button, “page advance” button, an so on. The systemcontroller 151 also controls a motor 153 that is provided for drivingthe media pick up mechanism 148 and a motor 154 for driving the mediatransport rollers 147.

It is necessary for the system controller 151 to identify when a sheetof paper 146 is moving past the printhead 141, so that printing can beeffected at the correct time. This time can be related to a specifictime that has elapsed after the media pick up mechanism 148 has pickedup the sheet of paper 146. Preferably, however, a paper sensor (notshown) is provided, which is connected to the system controller 151 sothat when the sheet of paper 146 reaches a certain position relative tothe printhead 141, the system controller can effect printing. Printingis effected by triggering a print data formatter 155 which provides theprint data 144 to the printhead 141. It will therefore be appreciatedthat the system controller 151 must also interact with the print dataformatter 155.

The print data 144 emanates from an external computer (not shown)connected at 156, and may be transmitted via any of a number ofdifferent connection means, such as a USB connection, an ETHERNETconnection, a IEEE1394 connection otherwise known as firewire, or aparallel connection. A data communications module 157 provides this datato the print data formatter 155 and provides control information to thesystem controller 151.

Although the invention is described above with reference to specificembodiments, it will be understood by those skilled in the art that theinvention may be embodied in many other forms. For example, although theabove embodiments refer to the heater elements being electricallyactuated, non-electrically actuated elements may also be used inembodiments, where appropriate.

1. A method of producing an ink jet printhead, the method comprising thesteps of: forming a substrate having defined therein a nozzle chamberfor receiving and storing a fluid, the chamber fed at one side by aninlet passage; forming a nozzle plate in-situ on the substrate to definea nozzle opening on an opposite side of the nozzle chamber to the inletpassage; forming first and second heater elements suspended between thenozzle opening and the inlet passage, the heater elements each havingtwo opposite planar sides and each positioned to be in direct thermalcontact with the fluid stored in the nozzle chamber at both opposedplanar sides; connecting the first heater element to a first drivecircuit; and connecting the second heater element to a second drivecircuit separate from the first drive circuit, wherein the first heaterelement is formed on a different layer to the second heater element, andthe first heater element is formed with a surface area larger than thatthe second heater element.
 2. The method of claim 1, wherein the nozzleplate is formed with a thickness of 2 to 2.5 microns
 3. The method ofclaim 1, wherein the second heater element is formed above the firstheater element with respect to the inlet passage.
 4. The method of claim1 wherein the nozzle plate is formed by chemical vapor deposition. 5.The method of claim 4, wherein the chemical vapor deposition is ofsilicon nitride.
 6. The method of claim 4, wherein the chemical vapordeposition is of silicon dioxide.
 7. The method of claim 4, wherein thechemical vapor deposition is of oxi-nitride.
 8. The method of claim 1,wherein each heater element is formed as a cantilevered beam suspendedin the fluid in thermal contact therewith, and supported at one end bythe nozzle chamber.
 9. The method of claim 1, wherein each heaterelement is formed to have a heated portion having a mass of less than 10nanograms.
 10. The method of claim 1, further comprising a step ofcoating each heater element with a conformal protective coating, thestep of coating applying the conformal protecting coating to all sidesof the heater element substantially simultaneously.